The CIF ion sputtering instrument is a high-precision device specifically designed for depositing coatings of precious metals and alloy materials. By integrating advanced control technology with user-centric design, it ensures precise, efficient, and stable sputtering processes. Widely used in scientific research and precision manufacturing applications, the instrument delivers high-quality, highly consistent coating results.
Function & Features
Intelligent touch control and data visualization.
A 7-inch color touchscreen supports Chinese and English for real-time monitoring and precise control of process parameters. It stores up to 20 recipe programs, ensuring data traceability and improved process standardization and repeatability.
Flexible operation with dual-mode compatibility.
The equipment, powered by a PLC control system, enables smooth switching between manual and automatic modes, meeting diverse application needs with greater operational flexibility.
Precise pressure regulation and broad compatibility.
The system integrates a Pirani vacuum gauge for precise measurement and control, automatically interlocking with the vacuum pump and proportional valve to maintain a stable vacuum under varying conditions.
Uniform coating performance and high consistency.
The sample stage offers adjustable rotational speed (0–50 rpm) and vertical height (15–50 mm), enhancing film uniformity, process consistency, and compatibility with various target materials.
Ergonomic design for user comfort.
The operation panel is angled at 60° based on ergonomic design, with a clear, intuitive interface for smooth and easy operation.
Low-temperature processing preserves sample integrity.
During coating, the sample temperature is kept at 40–50°C to prevent thermal damage and oxidation, preserving the sample's intrinsic properties.
Cleanroom-level contamination control.
The system features gas backfill purging and a HEPA filtration system to minimize contaminants and ensure a clean, reliable coating environment.
Comprehensive safety protection.
Safety features include automatic power cutoff when the chamber door opens and multiple built-in safety mechanisms for enhanced protection and operational safety.
Technical Specifications
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Model
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IBS150
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Applicable target materials
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Precious metals (Au, Pt, Pd), alloys (Au-Pt, Au-Pd, etc.)
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Chamber
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Material: Quartz glass; Size: Φ150xH145mm
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Sample Stage
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Φ65mm，Rotate speed: 0-50rpm, adjustable;
Height:15–50mm, adjustable; It accommodates multiple standard SEM sample holders.
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Gas Control
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The electromagnetic proportional valve allows precise, rapid, and repeatable control of gas flow rate.
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Sputtering Source
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Magnetron sputtering, maximum 500V / 60mA
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Sample Size
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Φ57mm，T0.1-2mm
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Sputtering Time
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1-9999s
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Sample Temperature
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＜50℃
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Vacuum Control
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Pirani vacuum gauge, measurement range:5×10⁻²~1.2×10⁵Pa
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Vacuum Pump
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Pumping speed: 8 m³/h; Ultimate vacuum: < 1 Pa;
Pumping time: < 2 - 3 min
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Overall Dimension
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W300×D400×H400mm
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Power Supply
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AC220V，240W
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