The CPC Series production plasma cleaners by CIF are specifically designed to cater to the needs of both R&D and industrial customers. With their versatile configurations and a vacuum chamber featuring a layered design, the CPC series plasma cleaning machines prove highly adaptable for various production scenarios. These state-of-the-art machines from CIF excel in plasma cleaning, activation, etching, and other applications while demonstrating exceptional stability, performance, repeatability, and uniformity even in challenging environments.
Function & Features
Intelligent control and humanized operation
- Equipped with a 7 - inch color touch - screen, it supports both Chinese and English interfaces, facilitating intuitive interaction.
- It is integrated with an internal PLC industrial control system, which supports both manual and automatic operation modes and enables full - process automated control.
- It can store 20 groups of programmable recipes and supports the storage, output, and full - process traceability of process data, thereby achieving intelligent production management.
Precision Craftsmanship and Gas Control System
- Intelligent Vacuum Control: Enables precise vacuum regulation through two operational modes—adjustment of gas flow rate or chamber pressure-providing flexible and intelligent process control.
- Precise Gas Injection: Uses mass flow controllers for precise delivery of process gases. The system comes standard with a dual-gas configuration, with optional multi-channel configurations available to support a wide range of process gases, including oxygen, argon, nitrogen, carbon tetrafluoride, and hydrogen.
- Uniform Gas Injection Design: Features a multi-channel gas inlet structure that overcomes the uneven distribution of conventional single-channel designs, ensuring consistent and uniform processing effects.
- Contamination Prevention: Integrated with HEPA high-efficiency particulate air filters, along with gas backfill and purge functionalities, to minimize the risk of secondary contamination and maintain a clean processing environment.
Reliable Structure and Wide Adaptability
- The vacuum chamber and pipeline system are made of 316 stainless steel, ensuring cleanliness, corrosion resistance, and process purity.
- The design is compact and space-efficient.
- It handles samples of various materials, shapes, and sizes, offering broad applicability.
- The sample processing is conducted at low temperatures to prevent thermal damage and oxidation.
Stable, efficient, economical and energy-saving
- High processing efficiency and consistent repeatability ensure stable mass production.
- The machine operates stably with low operating costs, minimal maintenance, and less wear.
Comprehensive safety protection
- Features multiple safety mechanisms: automatic power cutoff when the cabin door opens, plus controllable pressure relief and other functions.
- It has a run/stop indicator to ensure operational safety for personnel and samples.
Technical Specification
|
Model
|
CPC10
|
CPC15
|
CPC27.5
|
CPC35
|
|
Chamber Size
|
w: 180mm
h: 180mm
d: 330mm
|
w: 240mm
h: 240mm
d: 260mm
|
w: 250mm
h: 250mm
d: 440mm
|
w: 320mm
h: 320mm
d: 350mm
|
|
Chamber Volume
|
10.7L
|
15L
|
27.5L
|
35L
|
|
Chamber Material
|
stainless steel
|
stainless steel
|
stainless steel
|
stainless steel
|
|
Working Area, mm
|
W180xD280
|
W240xD210
|
W250xD390
|
W320xD300
|
|
Electrodes layout
|
2 layers
|
2 layers
|
2 layers
|
3-4 layers
|
|
RF Frequency
|
13.56MHz
|
13.56MHz
|
13.56MHz
|
13.56MHz
|
|
RF Power
|
10-300W
|
10-300W
|
10-300W
|
10-300W
|
|
Matcher
|
Automatic
|
Automatic
|
Automatic
|
Automatic
|
|
Plasma Excitation
|
Capacitive
|
Capacitive
|
Capacitive
|
Capacitive
|
|
Current
|
1.2A
|
1.2A
|
1.2A
|
1.2A
|
|
Time Setting
|
9999 sec
|
9999 sec
|
9999 sec
|
9999 sec
|
|
Gas Stable Time
|
1 min
|
1 min
|
1 min
|
1 min
|
|
Vacuum Degree
|
Less than 100pa
|
Less than 100pa
|
Less than 100pa
|
Less than 100pa
|
|
Control System
|
7 "PLC touch screen controller
|
7 "PLC touch screen controller
|
7 "PLC touch screen controller
|
7 "PLC touch screen controller
|
|
Process Gas
|
2 MFC
|
2 MFC
|
2 MFC
|
2 MFC
|
|
Product Size, mm
|
L610xW550 xH465
|
L670xW550
xH525
|
L850xW560 xH535
|
L625xW600
xH805
|
|
Packing Size, mm
|
L730xW700 xH720
|
L790xW775
xH780
|
L970xW785 xH790
|
L740xW775
xH1045
|
|
Pumping speed
|
~8m³/h
|
~8m³/h
|
~16m³/h
|
~16m³/h
|
|
Power Supply
|
AC220V 50/60Hz 475W
|
AC220V 50/60Hz 475W
|
AC220V 50/60Hz 475W
|
AC220V 50/60Hz 475W
|
|
Net Weight
|
104kg
|
109kg
|
120kg
|
135kg
|
|
Model
|
CPC 60
|
CPC80
|
CPC120
|
CPC150
|
|
Chamber Size
|
w: 320mm
h: 320mm
d: 585mm
|
w: 420mm
h: 420mm
d: 500mm
|
w: 500mm
h: 500mm
d: 450mm
|
w: 500mm
h: 500mm
d: 600mm
|
|
Chamber Volume
|
60L
|
80L
|
120L
|
150L
|
|
Chamber Material
|
stainless steel
|
stainless steel
|
stainless steel
|
stainless steel
|
|
Working Area, mm
|
W320xD535
|
W420xD450
|
W500xD400
|
W500xD550
|
|
Electrodes layout
|
3-4 layers
|
6 layers
|
8-10 layers
|
10-15 layers
|
|
RF Frequency
|
13.56MHz
|
13.56MHz
|
13.56MHz
|
13.56MHz
|
|
RF Power
|
10-600W
|
10-600W
|
10-1000W
|
10-1000W
|
|
Matcher
|
Automatic
|
Automatic
|
Automatic
|
Automatic
|
|
Plasma Excitation
|
Capacitive
|
Capacitive
|
Capacitive
|
Capacitive
|
|
Current
|
1.2A
|
1.2A
|
1.2A
|
1.2A
|
|
Time Setting
|
9999 sec
|
9999 sec
|
9999 sec
|
9999 sec
|
|
Gas Stable Time
|
1 min
|
1 min
|
1 min
|
1 min
|
|
Vacuum Degree
|
Less than 100pa
|
Less than 100pa
|
Less than 100pa
|
Less than 100pa
|
|
Control System
|
7 "PLC touch screen controller
|
7 "PLC touch screen controller
|
7 "PLC touch screen controller
|
7 "PLC touch screen controller
|
|
Gas Control
|
2 MFC
|
2 MFC
|
2 MFC
|
2 MFC
|
|
Product Size, mm
|
L625xW835 xH805
|
L905xW845xH1940
|
L625xW600xH2010
|
L905xW845xH2010
|
|
Packing Size, mm
|
L740xW1010 xH1045
|
L1015xW1065xH2050
|
L1015xW1065xH2120
|
L1015xW1065xH2120
|
|
Pumping speed
|
~30m³/h
|
~30m³/h
|
~48m³/h
|
~48m³/h
|
|
Power Supply
|
AC220V 50/60Hz 830W
|
AC380V 50/60Hz 830W
|
AC380V 50/60Hz 830W
|
AC380V 50/60Hz 830W
|
|
Net Weight
|
169kg
|
465kg
|
485kg
|
575kg
|
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