CIF has launched the VGB series of plasma cleaning equipment specifically designed for integration with glove boxes. This equipment features a chamber structure optimized for glove box environments, incorporating a rational design that facilitates seamless integration. It is characterized by ease of installation, stable performance, high practicality, and low maintenance requirements, making it an ideal solution for applications within glove box systems.

Function & Features

• Intelligent interactive interface: Featuring a 7-inch color touchscreen, the system supports bilingual operation in Chinese and English. It enables real-time monitoring and automatic adjustment of process parameters. With 20 pre-programmed recipes, the system allows for efficient storage and traceability of process data.
• Reliable control system: It adopts PLC for full-process control and supports both manual and automatic operation modes to ensure a stable and reliable cleaning process.
• Bidirectional intelligent vacuum control: The system can precisely control the vacuum degree through two modes of adjusting gas flow or chamber pressure, providing more flexible and intelligent process control to meet diverse precision processing requirements.
• Precise gas management: Equipped with mass flowmeters, it supports various gas sources such as oxygen, argon, nitrogen, hydrogen and mixed gases, with high control accuracy.
• Highly efficient and stable process: The treatment process is fast, uniform, and repeatable, with no pollution; the sample processing temperature is low, avoiding thermal damage and thermal oxidation.
• Comprehensive safety protection: The power is automatically cut off when the door is opened, and it is equipped with multiple protection mechanisms such as controllable pressure relief to ensure the safety of operation and samples.

Technical Specification

Model	VGB3	VGB3 Plus
Chamber
Chamber Size	D200XΦ160mm	D200XΦ160mm
Chamber Volume	4L	4L
Chamber Material	stainless steel/quartz	stainless steel/quartz
Generator
RF Frequency	40KHz	13.56MHz
Matcher	Auto Matching	Auto Matching
Plasma Excitation	Capacitive	Capacitive or ICP
RF Power	10-300W	10-150W
Process and Gas Control
Gas Control	Mass flowmeter (standard)
Working Area	L200xW155mm
Time Setting	9999 sec
Vacuum Pump	Pumping speed 4m³/h
Gas Stable Time	1 min
Vacuum Degree	Less than 100pa
Physical Specifications
Chamber Dimensions	L235xW345xH245mm (external)
Controller Dimensions	L330xW490xH190mm
Packing Size	L450xW640xH690mm
Net Weight	25kg
Power Supply	AC220V 50/60Hz, 666/316W

CIF is a Chinese manufacturer of plasma cleaners, UV Ozone cleaners, spin coaters. Our factory covers an area of over 4000 square meters. We have obtained a number of patents and have passed GB/ T19001-2016 /ISO9001-2015 quality management system certification, GB/T24001- 2016/ISO14001:2015 environmental management system certification.