The CIF scanning electron microscope (SEM) plasma cleaner employs a remote plasma cleaning source, enabling efficient and rapid removal of contaminants while significantly minimizing potential damage to sensitive samples. This system is primarily designed to eliminate hydrocarbon contamination from the vacuum chambers and sample surfaces of SEM, FIB, and other related instrumentation. Compatible with mainstream electron microscope brands both domestically and internationally, it helps maintain optimal equipment performance and imaging quality.

Function & Features

• Intelligent interactive interface: Featuring a 7-inch color touchscreen, the system supports bilingual operation in Chinese and English. It enables real-time monitoring and automatic adjustment of process parameters. With 20 pre-programmed recipes, the system allows for efficient storage and traceability of process data.
• Reliable control system: It adopts PLC for full-process control and supports both manual and automatic operation modes to ensure a stable and reliable cleaning process.
• Bidirectional intelligent vacuum control: The system can precisely control the vacuum degree through two modes of adjusting gas flow or chamber pressure, providing more flexible and intelligent process control to meet diverse precision processing requirements.
• Precise gas management: Equipped with mass flowmeters, it supports various gas sources such as oxygen, argon, nitrogen, hydrogen and mixed gases, with high control accuracy.
• Remote plasma cleaning source: Physically isolates the plasma from the sample, effectively reducing direct bombardment.
• High-efficiency and rapid cleaning: Significantly shorten the pretreatment time and quickly remove contaminants such as hydrocarbons.
• Extremely low sample damage: The optimized process can protect the original structure and surface morphology of the sample to the greatest extent.

Technical Specification

Model	CIF-SEM
Generator	13.56MHz, 5-150W.
	Remote plasma source, automatic matcher.
Working Pressure	0.3-3Pa (Typical process)
Flange Connector	KF40（Compatible with CF40）
Gas Control	Standard: single mass flowmeter (MFC, 0-500 sccm). Optional: dual mass flowmeters (MFC). Automatic flow control system with robust resistance to environmental temperature and pressure variations.
Processing Gas	Oxygen, argon, nitrogen, hydrogen and other gas sources.
Guaranteed Vacuum	Vacuum gauge and solenoid valve safety interlock mechanism.
Optional gas source expansion	Oxygen /nitrogen /hydrogen generator. H2 purity: > 99.999%, output flow: 0-500 sccm.
Operation Panel	7-inch full-color touch screen, supporting both Chinese and English interfaces.
Product Size	L385xW400xH495 mm
Packing Size	L535xW520xH735 mm
Power Supply	AC 220V, 50/60Hz, 320W
Net Weight	27kg
Warranty	24 months

CIF is a Chinese manufacturer of plasma cleaners, UV Ozone cleaners, spin coaters. Our factory covers an area of over 4000 square meters. We have obtained a number of patents and have passed GB/ T19001-2016 /ISO9001-2015 quality management system certification, GB/T24001- 2016/ISO14001:2015 environmental management system certification.