The CIF transmission electron microscope (TEM) sample holder cleaning system features a remote ion source design, enabling rapid and efficient removal of hydrocarbon contaminants with minimal bombardment damage, while maintaining compatibility with conventional plasma cleaning methods. This system is specifically engineered for the decontamination of TEM and scanning electron microscope (SEM) samples and their corresponding holders.

Function & Features

• Intelligent interactive interface: Featuring a 7-inch color touchscreen, the system supports bilingual operation in Chinese and English. It enables real-time monitoring and automatic adjustment of process parameters. With 20 pre-programmed recipes, the system allows for efficient storage and traceability of process data.
• Reliable control system: It adopts PLC for full-process control and supports both manual and automatic operation modes to ensure a stable and reliable cleaning process.
• Bidirectional intelligent vacuum control: The system can precisely control the vacuum degree through two modes of adjusting gas flow or chamber pressure, providing more flexible and intelligent process control to meet diverse precision processing requirements.
• Precise gas management: Equipped with mass flowmeters, it supports various gas sources such as oxygen, argon, nitrogen, hydrogen and mixed gases, with high control accuracy.
• Remote ion cleaning source: The remote ion cleaning source is integrated with an automatic matching unit.
• Multi-purpose in one machine: Compatible with various samples and cleaning modes.
• High efficiency and low damage: Rapidly remove contaminants while minimizing bombardment damage.

Technical Specification

Model	CIF-TEM
Generator	13.56MHz, 5-150W
	Remote plasma source, automatic matcher
Gas Control	Standard: single mass flowmeter (MFC, 0-500sccm). Optional: dual mass flowmeters (MFCs). Automatic flow control system with robust resistance to environmental temperature and pressure variations.
Processing Gas	Oxygen, argon, nitrogen, hydrogen and other gas sources.
Vacuum Pump Requirements	Backing pump
	Pumping rate: 2.5 m³/h
	Molecular pump
	Ultimate vacuum：LF<8*10-6Pa，CF<8*10-7Pa
	Pumping speed: 85L/s（N2）
	Inlet flange：DN63 ISO-K(LF)/ CF
	Vacuum control: Pirani vacuum gauge, measuring range: 1.0×10⁻⁵ Pa ~ 1×10⁵ Pa
	Safety interlock mechanism for vacuum gauge and solenoid valve.
Chamber	Cleaning chamber dimensions: Ø180 mm × H100 mm; Cleaning capacity: 3 TEM sample holders can be cleaned simultaneously.
Compatible Brands	Compatible with sample holders of mainstream electron microscopes such as Thermo Fisher (FEI) , Hitachi, and JEOL.
Control Panel	7-inch full-color touch screen, supporting both Chinese and English interfaces.
Physical Specifications	Power Supply: AC 220V, 50/60Hz, 720W; Product Dimensions: 580 mm (L) × 505 mm (W) × 490 mm (H); Package Dimensions: 700 mm (L) × 655 mm (W) × 820 mm (H) Net Weight: 68 kg
Warranty	24 months

CIF is a Chinese manufacturer of plasma cleaners, UV Ozone cleaners, spin coaters. Our factory covers an area of over 4000 square meters. We have obtained a number of patents and have passed GB/ T19001-2016 /ISO9001-2015 quality management system certification, GB/T24001- 2016/ISO14001:2015 environmental management system certification.