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Research-oriented plasma cleaner (CPC-F, CPC-FM)
Research-oriented plasma cleaner (CPC-F, CPC-FM)
Origin of place China
Model CPC-F/Plus, CPC-FM/Plus
Supplier CIF(Beijing)Tech Co.,Ltd.
Price
Hits 36
Updated 1/29/2026
  • Product Detail
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Applications

Plasma cleaners are widely used in materials science, microelectronics, semiconductors, circuit boards, LEDs, microfluidics, photoelectric solar energy and other fields for the purposes of material surface cleaning, activation, modification and etching.

Function & Features

  • Intelligent interactive interface: Featuring a 7-inch color touchscreen, the system supports bilingual operation in Chinese and English. It enables real-time monitoring and automatic adjustment of process parameters. With 20 pre-programmed recipes, the system allows for efficient storage and traceability of process data.
  • Reliable control system: It adopts PLC for full-process control and supports both manual and automatic operation modes to ensure a stable and reliable cleaning process.
  • Bidirectional intelligent vacuum control: The system can precisely control the vacuum degree through two modes of adjusting gas flow or chamber pressure, providing more flexible and intelligent process control to meet diverse precision processing requirements.
  • Precise gas management: Equipped with gas float flowmeters or mass flowmeters, it supports various gas sources such as oxygen, argon, nitrogen, hydrogen and mixed gases, with high control accuracy.
  • Clean and anti-pollution design: Equipped with gas backfill and purge function, and fitted with HEPA high-efficiency filters to effectively prevent secondary pollution.
  • High-quality material structure: The vacuum chamber can be made of 316 stainless steel or quartz, and the entire vacuum pipeline system is made of 316 stainless steel, which is corrosion-resistant and pollution-free.
  • Humanized operation design: The operation panel is designed at a 60° angle, which conforms to ergonomics, with a friendly interface and convenient operation; the upper control and lower cabin structure is compact, saving space; the front panel is concave, protecting the flowmeter and cabin door from damage.
  • Highly efficient and stable process: The treatment process is fast, uniform, and repeatable, with no pollution; the sample processing temperature is low, avoiding thermal damage and thermal oxidation.
  • Comprehensive safety protection: The power is automatically cut off when the door is opened, and it is equipped with multiple protection mechanisms such as controllable pressure relief to ensure the safety of operation and samples.

Technical Specification

Model CPC-F CPC-F Plus CPC-FM CPC-FM plus
RF Frequency 40KHz 13.56MHz 40KHz 13.56MHz
RF Power 10-300W 10-150W 10-300W 10-150W
Matcher Auto match Auto match Auto match Auto match
Plasma Excitation Capacitive or inductive coupling (ICP) Capacitive or inductive coupling (ICP) Capacitive or inductive coupling (ICP) Capacitive or inductive coupling (ICP)
Gas Control Dual float flowmeters Dual float flowmeters Dual MFC Dual MFC
Chamber Size D250xΦ160mm D250xΦ160mm D250xΦ160mm D250xΦ160mm
Chamber Material Stainless steel or quartz Stainless steel or quartz Quartz Quartz
Chamber Volume 5L 5L 5L 5L
Working Area L250xW160mm L250xW160mm L250xW160mm L250xW160mm
Time Setting 9999 sec 9999 sec 9999 sec 9999 sec
Vacuum Pump performance 4m³/h 4m³/h 4m³/h 4m³/h
Gas Stable Time 1 min 1 min 1 min 1 min
Vacuum Degree Less than 100pa Less than 100pa Less than 100pa Less than 100pa
Power Supply AC220V 50/60Hz 420/310W AC220V 50/60Hz 420/310W AC220V 50/60Hz 420/320W AC220V 50/60Hz 420/320W
Product Size L440xW410xH455mm L440xW410xH455mm L440xW410xH455mm L440xW410xH455mm
Packing Size L580xW580xH695mm L580xW580xH695mm L580xW580xH695mm L580xW580xH695mm
Net Weight 32kg 32kg 32kg 32kg

 

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